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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">mateltech</journal-id><journal-title-group><journal-title xml:lang="ru">Известия высших учебных заведений. Материалы электронной техники</journal-title><trans-title-group xml:lang="en"><trans-title>Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1609-3577</issn><issn pub-type="epub">2413-6387</issn><publisher><publisher-name>MISIS</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.17073/1609-3577-2015-2-103-109</article-id><article-id custom-type="elpub" pub-id-type="custom">mateltech-166</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Материаловедение и технология. Полупроводники</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>MATERIALS SCIENCE AND TECHNOLOGY. SEMICONDUCTORS</subject></subj-group></article-categories><title-group><article-title>ОПТИМИЗАЦИЯ УРОВНЯ ЛЕГИРОВАНИЯ КРЕМНИЯ «СОЛНЕЧНОГО» КАЧЕСТВА ДЛЯ ПОВЫШЕНИЯ ПРИГОДНОГО ОБЪЕМА СЛИТКОВ И КПД СОЛНЕЧНЫХ ЭЛЕМЕНТОВ</article-title><trans-title-group xml:lang="en"><trans-title>Doping Optimization of Solar Grade (SOG) Silicon Ingots for Increasing Ingot Yield and Cell Efficiency</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Бетекбаев</surname><given-names>А. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Betekbaev</surname><given-names>A. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>председатель наблюдательного совета,</p><p>Бастобе, 041011</p></bio><bio xml:lang="en"><p>Chairman of the Supervisory Board of «MC KazSilicon”» LLP, Kazatomprom,</p><p>Bastobe, 041011</p></bio><email xlink:type="simple">abetekbaev@kazatomprom.kz</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Мукашев</surname><given-names>Б. Н.</given-names></name><name name-style="western" xml:lang="en"><surname>Mukashev</surname><given-names>B. N.</given-names></name></name-alternatives><bio xml:lang="ru"><p>профессор, доктор технических наук, академик НАН РК,</p><p>Бастобе, 041011</p></bio><bio xml:lang="en"><p>Professor, Doctor of science, Academician of NAS RK,</p><p>Bastobe, 041011</p></bio><email xlink:type="simple">mukashev2005@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Пеллисер</surname><given-names>Л.</given-names></name><name name-style="western" xml:lang="en"><surname>Pelissier</surname><given-names>L.</given-names></name></name-alternatives><bio xml:lang="ru"><p>генеральный директор,</p><p>ул. Илер де Шардонне, д 109, Гренобль, 38100</p></bio><bio xml:lang="en"><p>CEO,</p><p>109 Rue Hilaire de Chardonnet, 38100 Grenoble</p></bio><email xlink:type="simple">l.pelissier@ecmtech.fr</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Лай</surname><given-names>Ф.</given-names></name><name name-style="western" xml:lang="en"><surname>Lay</surname><given-names>Ph.</given-names></name></name-alternatives><bio xml:lang="ru"><p>PhD, технический директор,</p><p>ул. Илер де Шардонне, д 109, Гренобль, 38100</p></bio><bio xml:lang="en"><p>PhD, Technical Director,</p><p>109 Rue Hilaire de Chardonnet, 38100 Grenoble</p></bio><email xlink:type="simple">p.lay@ecmtech.fr</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Фортин</surname><given-names>Г.</given-names></name><name name-style="western" xml:lang="en"><surname>Fortin</surname><given-names>G.</given-names></name></name-alternatives><bio xml:lang="ru"><p>инженер,</p><p>ул. Илер де Шардонне, д 109, Гренобль, 38100</p></bio><bio xml:lang="en"><p>R&amp;D Engineer,</p><p>109 Rue Hilaire de Chardonnet, 38100 Grenoble</p></bio><email xlink:type="simple">g.fortin@ecmtech.fr</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Бунас</surname><given-names>Л.</given-names></name><name name-style="western" xml:lang="en"><surname>Bounaas</surname><given-names>L.</given-names></name></name-alternatives><bio xml:lang="ru"><p>PhD, инженер,</p><p>ул. Илер де Шардонне, д 109, Гренобль, 38100</p></bio><bio xml:lang="en"><p>PhD, R&amp;D Engineer,</p><p>109 Rue Hilaire de Chardonnet, 38100 Grenoble</p></bio><email xlink:type="simple">l.bounaas@ecmtech.fr</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Скаков</surname><given-names>Д. М.</given-names></name><name name-style="western" xml:lang="en"><surname>Skakov</surname><given-names>D. M.</given-names></name></name-alternatives><bio xml:lang="ru"><p>генеральный директор, </p><p>Бастобе, 041011</p></bio><bio xml:lang="en"><p>General manager,</p><p>Bastobe, 041011</p></bio><email xlink:type="simple">skakovdm@gmail.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Павлов</surname><given-names>А. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Pavlov</surname><given-names>A. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>инженер,</p><p>Бастобе, 041011</p></bio><bio xml:lang="en"><p>Engineer of PTD,</p><p>Bastobe, 041011</p></bio><email xlink:type="simple">art_roll@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>ТОО «МК «KazSilicon»</institution><country>Казахстан</country></aff><aff xml:lang="en"><institution>«MC «KazSilicon» LLP.</institution><country>Kazakhstan</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>ECM Greentech</institution><country>Франция</country></aff><aff xml:lang="en"><institution>ECM Greentech</institution><country>France</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2015</year></pub-date><pub-date pub-type="epub"><day>04</day><month>06</month><year>2016</year></pub-date><volume>18</volume><issue>2</issue><fpage>103</fpage><lpage>109</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Бетекбаев А.А., Мукашев Б.Н., Пеллисер Л., Лай Ф., Фортин Г., Бунас Л., Скаков Д.М., Павлов А.А., 2016</copyright-statement><copyright-year>2016</copyright-year><copyright-holder xml:lang="ru">Бетекбаев А.А., Мукашев Б.Н., Пеллисер Л., Лай Ф., Фортин Г., Бунас Л., Скаков Д.М., Павлов А.А.</copyright-holder><copyright-holder xml:lang="en">Betekbaev A.A., Mukashev B.N., Pelissier L., Lay P., Fortin G., Bounaas L., Skakov D.M., Pavlov A.A.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://met.misis.ru/jour/article/view/166">https://met.misis.ru/jour/article/view/166</self-uri><abstract><p>В ближайшем будущем поликристаллический кремний (ПК) «солнечного» качества (SoG) станет основным материалом для выращивания слитков мультикристаллического кремния (МКК), предназначенных для фотовольтаического (ФВ) производства, так как требует гораздо меньше энергии для очистки по сравнению с ПК, полученным в Сименс−процессе (ПК электронного качества).</p><p>Рассмотрено несколько видов ПК с различным уровнем содержания примесей (преимущественно бора и фосфора). Для каждого из этих видов ПК при выращивании их них слитков МКК в промышленном масштабе с использованием примесей бора и галлия оптимизированы выход годного кремния и эффективность солнечных элементов. Уровень легирования рассчитан таким образом, чтобы увеличить выход годного кремния из слитка МКК. После получения слитков проверено их качество (изменение удельного сопротивления по высоте кремниевых блоков, время жизни неосновных носителей заряда) и затем из пластин созданы солнечные элементы. За счет оптимизации уровня легирования выращены сопоставимые по выходу годного кремния слитки МКК из ПК SoG и ПК, полученного Сименс− процессом, а также изготовлены солнечные элементы, сопостовимые по эффективности преобразования солнечной энергии (КПД).</p><p>Исследование проведено на заводе Kazakhstan Solar Silicon в Усть−Каменогорске, с применением казахстанского и европейского ПК SoG, а также ПК, полученного Сименс− процессом. Печи для направленной кристаллизации для выращивания МКК изготовлены французской компанией ECM Technologies.</p></abstract><trans-abstract xml:lang="en"><p>In the close future, use of SoG should become prominent for photovoltaic ingot production as it requires much less energy for purification compared to Silicon grades using gas transformation and purification (usually Siemens process or equivalent also used for electronic−grade preparation). During this study, several kinds of silicon were compared with different rates of dopant content (mainly boron and phosphorus). Ingot yield and cell efficiency were optimized for each source of silicon at a production level (450 kg ingots) using boron or gallium doping. Starting from the resistivity specification given by the cell process, the doping level was adjusted in order to maximize the ingot silicon yield (weight of silicon bricks used for wafer cutting/ weight of Silicon ingot). After doping adjustment, ingot quality was checked: brick resistivity, lifetime of minority carriers and wafers were processed into solar cells. Optimizing of doping led to get comparable ingot yields and cell efficiencies using SoG and silicon purified by Siemens process or equivalent. The study was implemented at Kazakhstan Solar Silicon plant in Ust−Kamenogorsk using Kazakhstan SoG, SoG from a European manufacturer and polycrystalline Silicon purified by Siemens process. Directional solidification furnaces were manufactured by the French company ECM Technologies.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>фотовольтаика</kwd><kwd>кремний</kwd><kwd>бор</kwd><kwd>галлий</kwd><kwd>направленная кристаллизация</kwd><kwd>солнечные элементы</kwd></kwd-group><kwd-group xml:lang="en"><kwd>photovoltaic</kwd><kwd>silicon</kwd><kwd>boron</kwd><kwd>gallium</kwd><kwd>direct crystallization solar cells</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Luque, A. Handbook of photovoltaic science and engineering / A. Luque, S. Hegedus. − Chichester (UK) : John Wiley and Sons Ltd, 2011. − 1162 p. DOI: 10.1002/9780470974704</mixed-citation><mixed-citation xml:lang="en">Luque A., Hegedus S. S. Handbook of photovoltaic science and engineering. John Wiley &amp; Sons Ltd, 2011. 1162 p. 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