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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">mateltech</journal-id><journal-title-group><journal-title xml:lang="ru">Известия высших учебных заведений. Материалы электронной техники</journal-title><trans-title-group xml:lang="en"><trans-title>Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1609-3577</issn><issn pub-type="epub">2413-6387</issn><publisher><publisher-name>MISIS</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.17073/1609-3577j.met202406.593</article-id><article-id custom-type="elpub" pub-id-type="custom">mateltech-593</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Материаловедение и технология. Диэлектрики</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>MATERIALS SCIENCE AND TECHNOLOGY. DIELECTRICS</subject></subj-group></article-categories><title-group><article-title>Получение, кристаллическая структура и сегнетоэлектрические свойства наноразмерных пленок Ba2NdFeNb4O15/Si(001)</article-title><trans-title-group xml:lang="en"><trans-title>Synthesis, crystal structure and ferroelectric properties of Ba2NdFeNb4O15/Si(001) films</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0001-8066-4955</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Павленко</surname><given-names>А. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Pavlenko</surname><given-names>A. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>просп. Чехова, д. 41, Ростов-на-Дону, 344006</p><p>Павленко Анатолий Владимирович — доктор физ.-мат. наук, ведущий научный сотрудник, отдел физики, химии, астрономии</p></bio><bio xml:lang="en"><p>41 Chekhov Ave., Rostov-on-Don 344006</p><p>Anatoly V. Pavlenko — Dr. Sci. (Phys.-Math.), Leading Researcher</p></bio><email xlink:type="simple">Antvpr@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0001-5597-3801</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Стрюков</surname><given-names>Д. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Stryukov</surname><given-names>D. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>просп. Чехова, д. 41, Ростов-на-Дону, 344006</p><p>Стрюков Даниил Валерьевич — канд. физ.-мат. наук, старший научный сотрудник, отдел физики, химии, астрономии</p></bio><bio xml:lang="en"><p>41 Chekhov Ave., Rostov-on-Don 344006</p><p>Daniil V. Stryukov — Cand. Sci. (Phys.-Math.), Senior Researcher</p></bio><email xlink:type="simple">strdl@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Старухина</surname><given-names>С. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Staruknina</surname><given-names>S. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Ленинский просп., д. 4, стр. 1, Москва, 119049</p><p>Старухина Софья Сергеевна — лаборант-исследователь, лаборатория физики оксидных сегнетоэлектриков</p></bio><bio xml:lang="en"><p>4-1 Leninsky Ave., Moscow 119049</p><p>Sofia S. Staruknina — Laboratory Assistant Researcher, Laboratory of Physics of Oxide Ferroelectrics</p></bio><email xlink:type="simple">sofya.starukhina@mail.ru</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-1641-1731</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ильина</surname><given-names>Т. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Ilina</surname><given-names>T. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Ленинский просп., д. 4, стр. 1, Москва, 119049 </p><p>Ильина Татьяна Сергеевна — канд. физ.-мат. наук, младший научный сотрудник, лаборатория физики оксидных сегнетоэлектриков</p></bio><bio xml:lang="en"><p>4-1 Leninsky Ave., Moscow 119049</p><p>Tatiana S. Ilina — Cand. Sci. (Phys.-Math.), Junior Researcher, Laboratory of Physics of Oxide Ferroelectrics</p></bio><email xlink:type="simple">ilina.tatina@gmail.com</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0003-1047-3007</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Киселев</surname><given-names>Д. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Kiselev</surname><given-names>D. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Ленинский просп., д. 4, стр. 1, Москва, 119049 </p><p>Киселев Дмитрий Александрович — PhD, канд. физ.-мат. наук, заведующий лабораторией физики оксидных сегнетоэлектриков</p></bio><bio xml:lang="en"><p>4-1 Leninsky Ave., Moscow 119049</p><p>Dmitry A. Kiselev — Ph.D, Cand. Sci. (Phys.-Math.), Head of the Laboratory of Physics of Oxide Ferroelectrics</p></bio><email xlink:type="simple">dm.kiselev@gmail.com</email><xref ref-type="aff" rid="aff-2"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Федеральный исследовательский центр Южный научный центр Российской академии наук</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Federal Research Center the Southern Scientific Center, Russian Academy of Sciences</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Национальный исследовательский технологический университет «МИСИС»</institution><country>Россия</country></aff><aff xml:lang="en"><institution>National University of Science and Technology “MISIS”</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2024</year></pub-date><pub-date pub-type="epub"><day>29</day><month>07</month><year>2024</year></pub-date><volume>27</volume><issue>3</issue><fpage>223</fpage><lpage>231</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Павленко А.В., Стрюков Д.В., Старухина С.С., Ильина Т.С., Киселев Д.А., 2024</copyright-statement><copyright-year>2024</copyright-year><copyright-holder xml:lang="ru">Павленко А.В., Стрюков Д.В., Старухина С.С., Ильина Т.С., Киселев Д.А.</copyright-holder><copyright-holder xml:lang="en">Pavlenko A.V., Stryukov D.V., Staruknina S.S., Ilina T.S., Kiselev D.A.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://met.misis.ru/jour/article/view/593">https://met.misis.ru/jour/article/view/593</self-uri><abstract><p>Тонкие пленки феррониобата бария-ниодима (Ba2NdFeNb4O15) толщинами от 75 до 1000 нм были выращены методом высокочастотного катодного распыления на монокристаллических подложках Si(001) в кислородной атмосфере. Исследованы их кристаллическая структура, морфология поверхности, диэлектрические характеристики и особенностей формирования сегнетоэлектрического состояния. Установлено что пленки являются поликристаллическими текстурированными с преимущественной ориентацией осей [<xref ref-type="bibr" rid="cit001">001</xref>] в направлении нормали к поверхности подложки, в которых наблюдалась существенная деформация элементарной ячейки. Обнаружено, что с увеличением толщины пленок шероховатость их поверхности увеличивается и следует закону масштабирования. Из вольт-фарадных характеристик (по величине смещения и ширине гистерезиса) установлено, что с уменьшением толщины происходит увеличение коэрцитивного поля и возрастает внутреннее поле. Это также было подтверждено измерением локальных остаточных петель гистерезиса методом силовой микроскопии пьезоотклика. Кроме того, локальным приложением положительного и отрицательного внешнего поля удается сформировать поляризованные области, в которых в одном случае вектор поляризации направлен от подложки к поверхности пленки, а в другом, наоборот, от пленки к подложке. Также, был определен эффективный пьезоэлектрический коэффициент для всех исследованных гетероструктур. Обсуждаются причины выявленных закономерностей.</p></abstract><trans-abstract xml:lang="en"><p>Using the method of HF cathode sputtering in an oxygen atmosphere, Ba2NdFeNb4O15/Si(001) heterostructures with layer thicknesses from 75 to 1000 nm were manufactured. Their crystal structure, surface morphology, dielectric characteristics and features of the formation of the ferroelectric state were investigated. It has been established that the films are polycrystalline textured with a predominant orientation of the axes [<xref ref-type="bibr" rid="cit001">001</xref>] in the direction normal to the substrate surface, in which a significant deformation of the unit cell was observed. It was found that as the thickness of the films increases, the roughness of their surface increases and follows the scaling law. From the volt-farad characteristics (in terms of displacement and hysteresis width), it was found that with a decrease in thickness, the coercive field increases and the internal field increases. This was also confirmed by measuring local residual hysteresis loops using piezoelectric force microscopy. In addition, by the local application of positive and negative external fields, it is possible to form polarized regions in which, in one case, the polarization vector is directed from the substrate to the surface of the film, and in the other, on the contrary, from the film to the substrate. Also, the effective piezoelectric coefficient was determined for all the studied heterostructures. The reasons for the revealed patterns are discussed. </p></trans-abstract><kwd-group xml:lang="ru"><kwd>тетрагональная вольфрамовая бронза</kwd><kwd>BNFNO мультиферроик</kwd><kwd>диэлектрические характеристики</kwd><kwd>сканирующая зондовая микроскопия</kwd><kwd>поляризация</kwd></kwd-group><kwd-group xml:lang="en"><kwd>tetragonal tungsten bronze</kwd><kwd>BNFNO multiferroic</kwd><kwd>dielectric characteristics</kwd><kwd>scanning probe microscopy</kwd><kwd>polarization</kwd></kwd-group><funding-group><funding-statement xml:lang="ru">Исследования структуры и диэлектрических характеристик объектов были выполнены в рамках реализации ГЗ ЮНЦ РАН № гр. Проекта 122020100294-9. Исследования методам сканирующей зондовой микроскопии выполнены при поддержке Министерства науки и высшего образования РФ в рамках государственного задания (проект № FSME-2024-0001).</funding-statement><funding-statement xml:lang="en">The studies of the structure and dielectric characteristics of the objects were carried out within the framework of the implementation of the State Assignment of the Southern Scientific Center of the Russian Academy of Sciences No. gr. Project 122020100294-9. The studies using scanning probe microscopy methods were carried out with the support of the Ministry of Science and Higher Education of the Russian Federation within the framework of the state assignment (project No. FSME-2024-0001).</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Павленко А.В., Зинченко С.П., Стрюков Д.В., Ковтун А.П. 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