For citations:

Tompakova N.M., Polisan A.A. Investigation of the effect of short-term exposure of oxygen and hydrogen plasma on the composition and structure of thin tin dioxide films. Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 2021;24(2):119-130. (In Russ.) https://doi.org/10.17073/1609-3577-2021-2-119-130