For citations:
Krasnikov G.Y., Zaitsev N.A., Matyushkin I.V., Korobov S.V. Cellular Automation Model of Phase Separation during Annealing of Non–Soichiometric Silicon Oxide Layers. Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 2014;(2):109-115. (In Russ.) https://doi.org/10.17073/1609-3577-2014-2-109-115
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