For citations:

Kurochka A.S., Sergienko A.A., Kurochka S.P. INVESTIGATION OF ION−ELECTRON EMISSION IN THE PROCESS OF REACTIVE ION−BEAM ETCHING OF DIELECTRIC THIN FILM HETEROSTRUCTURES. Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 2015;18(3):195-200. (In Russ.) https://doi.org/10.17073/1609-3577-2015-3-195-200