For citations:

Smirnov I.S., Novoselova E.G., Egorov A.A., Monakhov I.S. APPLICATION OF IN SITU X–RAY REFLECTIVITY FOR DETERMINING PARAMETERS OF NANOSCALE SILICON FILMS. Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 2013;(1):35-37. (In Russ.) https://doi.org/10.17073/1609-3577-2013-1-35-37