Барьеры для инжекции электронов и дырок из подложки кремния в ВЧ-магнетронно напыленные пленки In2O3 : Er

Пленки In₂O₃ : Er были напылены на подложки кремния с помощью ВЧ-магнетронного распыления-осаждения. Для подложек кремния как n-, так и p-типа проводимости токи через полученные МОП-структуры (Si/In2O3 : Er/In-контакт) были описаны в рамках модели термоэмиссии основных носителей через барьер с коррекцией приложенного напряжения на потенциал, падающий в кремнии. С помощью измерения температурной зависимости прямых токов при малом, подбарьерном смещении были найдены барьеры для инжекции электронов и дырок из кремния в пленки, равные 0,14 и 0,3 эВ, соответственно. Полученный невысокий барьер для дырок объясняется наличием плотности дефектных состояний, которые простираются от края зоны валентности в запрещенную зону In₂O₃ : Er и создают там канал проводимости для дырок. Наличие плотности дефектных состояний в запрещенной зоне In₂O₃ : Er подтверждается данными фотолюминесценции в соответствующем интервале энергий 1,55—3,0 эВ. Выполнен анализ зонной структура гетероперехода Si/In₂O₃ : Er. На его основе установлен энергетический интервал между электронами в зоне проводимости In₂O₃ : Er и дырками в канале проводимости в запрещенной зоне, равный 1,56 эВ. 

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