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STATISTICAL ANALYSIS OF GE INFLUENCE ON RADIATION AND THERMAL STABILITY OF THE ELECTROPHYSICAL CHARACTERISTICS OF CZ–SI

BASED DEVICE N—P—N—P–STRUCTURES

https://doi.org/10.17073/1609-3577-2013-4-42-48

Abstract

The characteristics of low−power and high−power thyristors basen of dislocation−free single crystal silicon doped with ger- manium to the concentration range NGe ~ (0.05—1.5) • 1020 cm−3 have been investigated. The criterial parameters of thyristors exposed to radiation and high temperature gradients have been estimated using experimental data processing methods in the STATISTICA and MathCAD environments. We show the appropriateness of using germanium doped silicon for increasing the thermal stability and radiation strength of the devices exposed to γ−radiation in the range of doses of up to 2.94 • 106 mSv.

About the Authors

S. V. Bytkin
Zaporizhstal Integrated Iron & Steel Works JSC
Ukraine


T. V. Kritskaya
Zaporozhye State Engineering Academy
Ukraine


S. P. Kobeleva
National University of Science and Technology MISIS
Russian Federation






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For citations:


Bytkin S.V., Kritskaya T.V., Kobeleva S.P. STATISTICAL ANALYSIS OF GE INFLUENCE ON RADIATION AND THERMAL STABILITY OF THE ELECTROPHYSICAL CHARACTERISTICS OF CZ–SI

BASED DEVICE N—P—N—P–STRUCTURES. Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 2013;(4):42-48. (In Russ.) https://doi.org/10.17073/1609-3577-2013-4-42-48

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