For citations:
Balan N.N., Ivanov V.V., Kuzovkov A.V., Sokolova E.V., Shamin E.S. Basic approaches to photoresist mask formation modeling in computational lithography. Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 2019;22(4):279-289. (In Russ.) https://doi.org/10.17073/1609-3577-2019-4-279-289
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