For citations:
Komarov F.F., Komarov A.F., Mironov A.M., Zayats G.M., Makarevich Y.V., Miskevich S.A. Modeling of Ion Implantation and Rapid Thermal Treatments during the Formation of Active Regions of Submicron and Nanometer Silicon IС. Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 2012;(4):18-23. (In Russ.) https://doi.org/10.17073/1609-3577-2012-4-18-23
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