For citations:
Temirov A.A., Kubasov I.V., Turutin A.V., Ilina T.S., Kislyuk A.M., Kiselev D.A., Skryleva E.A., Sobolev N.A., Salimon I.A., Batrameev N.V., Malinkovich M.D., Parkhomenko Yu.N. Creattion of silicon-carbon films by induction assisted plasma chemical deposition. Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 2024;27(1):56-65. (In Russ.) https://doi.org/10.17073/1609-3577j.met202310.564