For citations:
Terekhov Y.A., Tetelbaum D.I., Zanin I.E., Pankov K.N., Spirin D.E., Mikhaylov A.N., Belov A.I., Ershov A.V. Diffraction Studies of the Formation of Silicon Nanocrystals in the SiOx/Si Compounds after Carbon Ion Implantation. Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 2012;(4):54-59. (In Russ.) https://doi.org/10.17073/1609-3577-2012-4-54-59
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