For citations:

Tapero K.I. LOW DOSE RATE EFFECTS IN SILICON BASED DEVICES AND INTEGRATED CIRCUITS: A REVIEW. Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 2016;19(1):5-21. (In Russ.) https://doi.org/10.17073/1609-3577-2016-1-5-21